高伟民，清华大学集成电路学院教授，博士生导师

Weimin Gao, Professor

E-mail：gaoweimin@tsinghua.edu.cn

通信地址：清华大学自强科技楼2号楼2-818室

高伟民1985年获浙江大学光学工程学士学位，1998年和2001年获比利时鲁汶大学物理学硕士和博士学位。

高伟民先后供职于比利时微电子研发中心（imec）、美国新思科技（Synopsys）和荷兰阿斯麦（ASML）公司，2025年加入清华大学集成电路学院。

高伟民博士是资深光刻技术专家，拥有二十多年先进光刻技术研发经验。他参与了从0.13微米到5纳米节点的多世代先进CMOS工艺中的光刻技术开发。技术专长涵盖广泛的光刻领域，包括先进光刻工艺开发、光刻成像技术、分辨率增强技术（RETs）、计算光刻、掩模板技术、光学邻近效应修正（OPC）、设计工艺协同优化技术（DTCO）等。在过去十五年里，他专注于极紫外光刻的应用技术开发。

高伟民曾在各类国际期刊和会议上发表百余篇论文，并受邀在多个国际会议上发表演讲。

Weimin Gao obtained a Bachelor's degree in Optical Engineering from Zhejiang University in 1985. He received his M.S. and Ph.D. in Physics from the University of Leuven (KU Leuven), Belgium, in 1998 and 2001, respectively. He had held positions at the imec, and Synopsys. From 2018 to 2025, he served as Technical Director at ASML in China. In 2025, he joined the School of Integrated Circuits at Tsinghua University.

Dr. Gao is an expert in advanced optical lithography with over 20 years of extensive experience. He has participated in the patterning development of multiple generations of advanced CMOS technology from the 0.13μm node down to the 5nm node. His technical expertise encompasses a broad range of lithographic areas, including patterning process development, lithography imaging, resolution enhancement techniques (RETs), computational lithography, photomask, optical proximity correction (OPC) and design-technology co-optimization (DTCO). For the past 15 years, Dr. Gao's research has focused on the development of EUV lithography applications and its extensions. He has over 100 publications in various international journals and conferences.